钛酸锶基片, Strontium titanium oxide substrate

丁二酸, Succinic Acid

磺胺醋酰, Sulfacetamide

4-磺基苯甲酸单钾盐, 4-Sulfobenzoic acid monopotassium salt

5-磺酸基水杨基酸二水合物, 5-Sulfosalicylic Acid Dihydrate

乙醇钽(V), Tantalum(V) ethoxide

氧化钽(V)溅射靶, Tantalum(V) oxide sputtering target

四乙氧基碲(IV), Tellurium(IV) ethoxide

碳酸铽(III)水合物, Terbium(III) carbonate hydrate

氧化铽(III,IV), Terbium(III,IV) oxide