钛酸锶基片, Strontium titanium oxide substrate

丁二酸, Succinic Acid

磺胺醋酰, Sulfacetamide

4-磺基苯甲酸单钾盐, 4-Sulfobenzoic acid monopotassium salt

5-磺酸基水杨基酸二水合物, 5-Sulfosalicylic Acid Dihydrate

乙醇钽(V), Tantalum(V) ethoxide

氧化钽(V)溅射靶, Tantalum(V) oxide sputtering target

二水碲酸, Telluric acid dihydrate

水合乙酸铽(III), Terbium(III) acetate hydrate

碘化铽(III), Terbium(III) iodide