应用
Cerium silicide is used as a surrogate material to investigate the feasibility of high-energy ball milling and Spark Plasma Sintering (SPS) for the production of uranium silicide.

备注
Incompatible with oxidizing agents.

基本信息

MDL
MFCD00168082

EINECS
234-602-1

分子式
CeSi₂

分子量
196.29

熔点
1620°

密度
5.31

灵敏度
Ambient temperatures.

形态
3-15mm Pieces

溶解性
Insoluble in water.

安全信息

TSCA
是