应用
Used as Magnetron sputtering source. The substrate bias during dc sputtering effectively reduces oxygen contamination in nichrome films. This in turn leads to an enhancement of the preferred orientation of the deposits.

备注
Thickness tolerance: ^+0.015in; Diameter tolerance: +0.020/-0.0in

基本信息

MDL
MFCD00673110

分子式
Ni:Cr; 80:20 wt%

灵敏度
Ambient temperatures.

溶解性
Insoluble in water.

GHS危害和防范说明

GHS符号

Hazard Statements
H317-H351
May cause an allergic skin reaction.Suspected of causing cancer.

Precautionary Statements
P201-P261-P280-P308+P313-P405-P501a
Obtain special instructions before use.Avoid breathing dust/fume/gas/mist/vapours/spray.Wear protective gloves/protective clothing/eye protection/face protection.IF exposed or concerned: Get medical advice/attention.Store locked up.Dispose of contents/container in accordance with local/regional/national/international regulations.

安全信息

危险类别
40-43
Limited evidence of a carcinogenic effect.May cause sensitization by skin contact.

安全等级
22-36
Do not breathe dust.Wear suitable protective clothing.

欧盟危险品标志

TSCA
是