应用
Tungsten sputtering target is used for Magnetron sputtering source. It is also used in electric filaments (e.g. in electric light bulbs),radiation shielding, military applications (e.g. armor and shells), as well as counter-balance materials.

备注
Thickness tolerance: ^+0.015in; Diameter tolerance: +0.020/-0.0in

基本信息

MDL
MFCD00011461

EINECS
231-143-9

灵敏度
Ambient temperatures.

溶解性
Insoluble in water.

安全信息

TSCA
是