应用
Palladium sputtering target is used for standard scanning electron microscopy (SEM) coating. It is utilized to cover as specimen with a thin layer of conducting material viz. palladium. It is needed to prevent charging of specimen with an electron beam in conventional SEM mode as well as to increase signal to noise ratio.

备注
Typical composition of alloy: Al 95.8-98.6%, Mg 0.8-1.2%, Si 0.4-0.8%, Cr 0.04-0.35%, Cu 0.15-0.4%, Fe 0.7% max, Zn 0.25% max, Mn 0.15% max, Ti 0.15% maxIncompatible with strong acids, halogens, bases and alcohols.

基本信息

MDL
MFCD00011167

EINECS
231-115-6

灵敏度
Ambient temperatures.

形态
≈154g/target

溶解性
Insoluble in water.

安全信息

TSCA
否